Patent Number: 202520413141.X
Features: The CCUS gas distribution device is designed such that, as gas enters the gas flow channel, it is directed by two sets of primary guide vanes to spread laterally to both sides of the device, thereby achieving uniform horizontal gas distribution. Simultaneously, the gas can also pass through the vent holes in the upper frame and diffuse upward, enabling upward gas flow and compensatory distribution at the top of the CCUS gas distribution device. This enhances gas flow efficiency, provides a larger gas-phase equilibrium space, improves the effectiveness of uniform gas distribution, and reduces manufacturing costs.
Patent Number: 202520413141.X
Features: The CCUS gas distribution device is designed such that, as gas enters the gas flow channel, it is directed by two sets of primary guide vanes to spread laterally to both sides of the device, thereby achieving uniform horizontal gas distribution. Simultaneously, the gas can also pass through the vent holes in the upper frame and diffuse upward, enabling upward gas flow and compensatory distribution at the top of the CCUS gas distribution device. This enhances gas flow efficiency, provides a larger gas-phase equilibrium space, improves the effectiveness of uniform gas distribution, and reduces manufacturing costs.
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